- Novel thiobarbituric acid derivatives, polymer including repeating unit derived therefrom, bottom anti-reflection coating composition containing the same and process for forming resist pattern using the composition
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The present invention relates to novel thiobarbituric acid derivatives, a polymer comprising a repeating unit derived from the same, a bottom anti-reflective coating (BARC) composition containing the same, and a process for forming resist patterns using the same. Specifically, the present invention relates to a BARC composition comprising thiobarbituric acid derivatives or a polymer comprising a repeating unit derived from the same, which prevents the reflection at an underlying layer in a lithographic process, and has fast dry etching rate, and thus is useful for semiconductor ultrafine patterning; and to a process for forming resist patterns using the same.COPYRIGHT KIPO 2017
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Paragraph 0114-0117
(2017/08/23)
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- Substituent effects on partition coefficients of barbituric acids
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Precise partition coefficients in 1-octanol-water at 25°C were determined for three 2-thiobarbituric acids and 14 barbituric acids with a wider range of substituents. The experimental log P values (log P(exp)) of barbituric acids were correlated with the carbon number and the branching effect of the C5 substituent(s) by linear regression analysis. The carbon number term makes a major contribution to the partition coefficients. The contribution of the polar effect of the C5 substituents was insignificant in contrast to a previous report. Hydrophobic constants (π) were determined for allyl, phenyl, and chloro-substituents, and these emperical π values gave much closer predicted calculated log P (log P(calc)) values when applied to the reported log P(exp) values.
- Wong,McKeown
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p. 926 - 932
(2007/10/02)
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