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11128-24-8

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11128-24-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 11128-24-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,1,1,2 and 8 respectively; the second part has 2 digits, 2 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 11128-24:
(7*1)+(6*1)+(5*1)+(4*2)+(3*8)+(2*2)+(1*4)=58
58 % 10 = 8
So 11128-24-8 is a valid CAS Registry Number.

11128-24-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name fluorosilicon

1.2 Other means of identification

Product number -
Other names Silane,fluoro

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:11128-24-8 SDS

11128-24-8Relevant articles and documents

Dagata, J. A.,Squire, D. W.,Dulcey, C. S.,Hsu, D. S. Y.,Lin, M. C.

, p. 151 - 155 (1987)

Grossman, E.,Bensaoula, A.,Ignatiev, A.

, p. 99 - 108 (1988)

Tanimoto, Mitsutoshi,Saito, Shuji,Endo, Yasuki,Hirota, Eizi

, p. 205 - 211 (1983)

Harding, David R.,Husain, David

, (1984)

Harding, David R.,Husain, David

, (1986)

Large rotational energy release in collision-induced SIF C(2)Δ-B(2)Σ(+) valence-Rydberg transfer

Jackson, Neil A.,Watson, Cameron W.,McKendrick, Kenneth G.

, (1995)

Distinct rotational population distributions were prepared in SiF C(2)Δ, v=0 radicals by laser excitation. Collisions with H2 or N2 transferred a fraction of the C(2)Δ molecules to the lower-lying B(2)Σ(+) state. B-X fluorescence spectra revealed the nasc

Akiyama, Yasunobu,Tanaka, Keiichi,Tanaka, Takehiko

, p. 15 - 20 (1989)

Energetics and dynamics in the reaction of Si+ with SiF4. Thermochemistry of SiFx and SiF+x (x=1, 2, 3)

Weber, M. E.,Armentrout, P. B.

, p. 6898 - 6910 (2007/10/02)

The title reaction is studied using guided ion beam mass spectrometry.Absolute reaction cross sections are measured as a function of kinetic energy from thermal to 40 eV, and three endothermic product channels are observed.The dominant SiF+ + SiF3 channel is only slightly endothermic, while the SiF3+ + SiF and SiF2+ + SiF2+ channels have much higher thresholds.The SiF3+ cross section magnitude is about half that of SiF+, while the SiF2+ cross section is an order of magnitude smaller than that of SiF+.A second feature which appears in the SiF2+ cross section is due to dissociation of SiF3+ .There is evidence that SiF+ and SiF3+ are produced via a direct mechanism.Competition between these two channels is interpreted in terms of molecular orbital correlations and qualitative potential energy surfaces.One surface is found to correlate only with the SiF3+ + SiF channel, while another correlates diabatically with this channel and adiabatically with the SiF+ + SiF3 channel.Competition on this latter surface has an energy dependence which is consistent with the Landau-Zener model.Reaction thresholds are analyzed to yield 298 K heats of formation for SiFx and SiFx+ species.From an evaluation of these and literature values, we recommend the following values:.

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