15106-88-4Relevant articles and documents
Atom-efficient transition-metal-free arylation ofN,O-acetals using diarylzinc reagents through Zn/Zn cooperativity
Borys, Andryj M.,Gil-Negrete, Jose M.,Hevia, Eva
supporting information, p. 8905 - 8908 (2021/09/10)
Exploiting the cooperative action of Lewis acid Zn(C6F5)2with diarylzinc reagents, the efficient arylation ofN,O-acetals to access diarylmethylamines is reported. Reactions take place under mild reaction conditions without the need for transtion-metal catalysis. Mechanistic investigations have revealed that Zn(C6F5)2not only acts as a Lewis acid activator, but also enables the regeneration of nucleophilic ZnAr2species, allowing a limiting 50 mol% to be employed.
Three-Component Difunctionalization of Cyclohexenyl Triflates: Direct Access to Versatile Cyclohexenes via Cyclohexynes
Cho, Seoyoung,McLaren, E. J.,Wang, Qiu
supporting information, p. 26332 - 26336 (2021/11/10)
Difunctionalization of strained cyclic alkynes presents a powerful strategy to build richly functionalized cyclic alkenes in an expedient fashion. Herein we disclose an efficient and flexible approach to achieve carbohalogenation, dicarbofunctionalization, aminohalogenation and aminocarbonation of readily available cyclohexenyl triflates. We have demonstrated the novel use of zincate base/nucleophile system for effective formation of key cyclohexyne intermediates and selective addition of various carbon and nitrogen nucleophiles. Importantly, leveraging the resulting organozincates enables the incorporation of a broad range of electrophilic partners to deliver structurally diverse cyclohexene motifs. The importance and utility of this method is also exemplified by the modularity of this approach and the ease in which even highly complex polycyclic scaffolds can be accessed in one step.
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0220, (2020/12/01)
PROBLEM TO BE SOLVED: To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU). SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [R1, R2, R3, R4, R5 and R6 each represent a halogen atom or the like; R7 and R8 each represent a halogen atom, OH or the like; R9 represents H or an alkyl group; m7 and m8 each represent an integer of 0-2; m9 represents an integer of 0-5; Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents a substituted/unsubstituted saturated hydrocarbon group; and Y1 represents a substituted/unsubstituted methyl group or alicyclic hydrocarbon group.] SELECTED DRAWING: None COPYRIGHT: (C)2021,JPO&INPIT