3277-26-7 Usage
Description
1,1,3,3-Tetramethyldisiloxane is a widely used organic silicon intermediate that is soluble in many organic solvents, such as aromatic hydrocarbon and petroleum hydrocarbons. It is commonly used as an organic silicon blocking agent due to its reactive Si-H groups in the molecular structure, which allows it to be used in the synthesis of copolymer macromolecules by hydrosilylation. The resulting copolymer macromolecules can be made into a series of reactive silicone oils.
Uses
1. Used in Chemical Synthesis Industry:
1,1,3,3-Tetramethyldisiloxane is used as a monomer for the preparation of silicone polymers or silicone resins, serving as an intermediate for preparing other organosilicon compounds. It is also utilized in non-aqueous polymer preparation and as a laboratory reagent.
2. Used in Organic Synthesis:
1,1,3,3-Tetramethyldisiloxane is used as an effective reducing agent in platinum-catalyzed reduction of carboxamides to amines and in the Au/TiO2-catalyzed hydrosilylation of carbonyl compounds, such as the reduction of aldehydes or ketones, relative to monohydrosilanes.
3. Used in the Production of Specialty Chemicals:
1,1,3,3-Tetramethyldisiloxane is used in the synthesis of polysiloxane containing functional end groups and for the preparation of high-performance organic silicone surfactants.
4. Used in the Manufacturing of Various Products:
1,1,3,3-Tetramethyldisiloxane is applicable to the production of many products, such as addition silicone rubber, silica gel, hydrogen polysiloxane, plastic, resin modifier, dendrite polymer special additives, and more.
5. Used in Direct Bromination Process:
1,1,3,3-Tetramethyldisiloxane enables a direct bromination of carboxylic acids in the presence of indium bromide (InBr3) as a catalyst.
Flammability and Explosibility
Highlyflammable
Purification Methods
1,Possible impurity is 1,1,5,5-tetramethyl-3-trimethylsiloxytrisiloxane b 154-155o/733mm. Fractionate it, collect fractions boiling below 80o and re-fractionate it. Its purity can be analysed by alkaline hydrolysis and measuring the volume of H2 liberated followed by gravimetric estimation of silica in the hydrolysate. It is unchanged when stored in glass containers in the absence of moisture for 2-3 weeks. Small amounts of H2 are liberated on long storage. Care should be taken when opening a container due to pressure developed. [Speier et al. J Am Chem Soc 79 974 1958, Emeléus & Smythe J Chem Soc 609 1958, IR: Kriegsmann Z Anorg Chem 299 78 1959, Beilstein 4 IV 3991.]
References
https://www.alfa.com/en/catalog/B23697/
http://www.organic-chemistry.org/chemicals/reductions/tetramethyldisiloxane-TMDSO.shtm
https://www.infona.pl/resource/bwmeta1.element.elsevier-722236cc-df38-37aa-bbed-029ec07d525f
Check Digit Verification of cas no
The CAS Registry Mumber 3277-26-7 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,2,7 and 7 respectively; the second part has 2 digits, 2 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 3277-26:
(6*3)+(5*2)+(4*7)+(3*7)+(2*2)+(1*6)=87
87 % 10 = 7
So 3277-26-7 is a valid CAS Registry Number.
InChI:InChI=1/C4H14OSi2/c1-6-5-7(2,3)4/h6H2,1-4H3
3277-26-7Relevant articles and documents
PROCESSES FOR SYNTHESIZING UNSYMMETRICAL DISILOXANES
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Paragraph 0044-0046, (2021/06/22)
Described herein are methods for making alkenyl disiloxanes, comprising combining an alkenyl halosilane with an alkyl halosilane and adding the mixture to water, an acidic aqueous solution, or a basic aqueous solution. The ratio of the alkenyl halosilane to the alkyl halosilane is about 10:1 to about 1:10. The alkenyl halosilane and the alkyl halosilane are mixed at about 20 °C to about 45 °C. The reaction product is separated and washed with saturated alkali carbonate solution.
Dendritic, nanosized building block for Siloxane-based materials: A spherosilicate dendrimer
Kawahara, Kazufumi,Hagiwara, Yoshiaki,Kuroda, Kazuyuki
experimental part, p. 13188 - 13196 (2012/02/06)
A spherosilicate dendrimer (DMS-1) with closely spaced reaction sites (Si-H groups) on the dendrimer surface has been synthesized by stepwise silylation of double-four-ring silicate with chlorotriethoxysilane (ClSi(OEt)3) and subsequently with chlorodimethylsilane (ClSiHMe2). DMS-1 consists of a maximum of 40 Si atoms in the interior frameworks and 24 reactive Si-H groups on the surface. Because DMS-1 is spherical and about 1.5 nm in diameter, it can be regarded as the smallest well-defined silica-based nanoparticle. DMS-1 also forms molecular crystals and is soluble in typical organic solvents. A molecularly ordered silica-based hybrid can be prepared by heating a cast film of DMS-1 at 180 °C for 5 days. The surface of DMS-1 can be modified by hydrosilylation with 1-hexadecene, triethoxyvinylsilane, and allylic-terminated tetraethylene glycol monomethyl ether. More than 20 Si-H groups out of 24 react with these reagents. The solubilities of the products depend on the modification. DMS-1 is not only a building block for nanohybrids, but also the smallest and most precisely designed siloxane-based nanoparticle.
Electrochemical synthesis of symmetrical difunctional disilanes as precursors for organofunctional silanes
Grogger, Christa,Loidl, Bernhard,Stueger, Harald,Kammel, Thomas,Pachaly, Bernd
, p. 105 - 110 (2007/10/03)
Difunctional disilanes of the general type XR2SiSiR2X (1-5) (X = OMe, H; R = Me, Ph, H) have been synthesized by electrolysis of the appropriate chlorosilanes XR2SiCl in an undivided cell with a constant current supply and in the absence of any complexing agent. Reduction potentials of the chlorosilane starting materials derived from cyclic voltammetry measurements were used to rationalize the results of preparative electrolyses. Organofunctional silanes of the general formula MeO(Me 2)SiC6H4Y (6a-c, 7) were subsequently obtained by the reaction of sym-dimethoxytetramethyldisilane (1) with NaOMe in the presence of p-functional aryl bromides BrC6H4Y (Y = OMe, NEt2, NH2).