4668-00-2Relevant articles and documents
Stable silanetriols that contain tert-alkoxy groups: Versatile precursors of siloxane-based nanomaterials
Suzuki, Jumpei,Shimojima, Atsushi,Fujimoto, Yasuhiro,Kuroda, Kazuyuki
, p. 973 - 980 (2008)
Novel tert-alkoxysilanetriols (ROSi(OH)3, R = adamantyl and 3-ethyl-3-pentyl) have been prepared from the corresponding tert- alkoxytrichlorosilanes and successfully used as molecular building blocks to produce ordered siloxane-based nanomateri
Molecularly designed nanoparticles by dispersion of self-assembled organosiloxane-based mesophases
Sakamoto, Shigeru,Tamura, Yasuhiro,Hata, Hideo,Shimojima, Atsushi,Kuroda, Kazuyuki,Sakamoto, Yasuhiro
, p. 9173 - 9177,5 (2014)
The design of siloxane-based nanoparticles is important for many applications. Here we show a novel approach to form core-shell silica nanoparticles of a few nanometers in size through the principle of dispersion of ordered mesostructures into single nanocomponents . Self-assembled siloxane-organic hybrids derived from amphiphilic alkyl-oligosiloxanes were postsynthetically dispersed in organic solvent to yield uniform nanoparticles consisting of dense lipophilic shells and hydrophilic siloxane cores. Insitu encapsulation of fluorescent dyes into the nanoparticles demonstrated their ability to function as nanocarriers. Self-assembled hybrid nanoparticles: A new type of oligosiloxane precursor self-assembles into reverse-micellar mesostructures, which can be transformed to nanoparticles with a siloxane core and an organic shell by dispersion in nonpolar organic solvents.
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Murata
, p. 347 (1952)
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ORGANOMETALLIC COMPOUND AND METHOD
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Page/Page column 9; 10, (2017/09/05)
A class of organometallic compounds is provided. The compounds correspond in structure to Formula 1 (A)x-M-(OR3)4-x wherein: A is selected from the group consisting of -NR1R2, -N(R4)(CH2)nN(R5R6), -N=C(NR4R5)(NR6R7), OCOR1, halo and Y; R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H; R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms; Y is selected from the group consisting of a 3- to 13-membered heterocyclic radical containing at least one nitrogen atom; R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms; M is selected from the group consisting of Si, Ge, Sn, Ti, Zr and Hf; x is an integer from 1 to 3; and n is an integer from 1 to 4. Compounds of the invention may be useful as precursors in chemical phase deposition processes such as atomic layer deposition (ALD), chemical vapour deposition (CVD), plasma assisted ALD and plasma assisted CVD. Methods of low temperature vapour phase deposition of metal oxide films, such as SiO2 films, are also provided.