Hafnium silicide

Base Information

• Chemical Name: Hafnium silicide
• CAS No.: 12401-56-8
• Molecular Formula: HfSi₂
• Molecular Weight: 234.661
• European Community (EC) Number: 235-640-1
• Wikidata: Q26841176
• Mol file: 12401-56-8.mol

Synonyms:Hafnium silicide;12401-56-8;hafnium;silicon;Hafnium disilicide;Hafnium silicide (HfSi2);HfSi2;Hf-Si2;EINECS 235-640-1;MFCD00167026;Chromium Sulfide (Cr2S3) Sputtering Targets;Q26841176

Chemical Property of Hafnium silicide

Chemical Property:

• Melting Point: 1680°C
• Boiling Point: °Cat760mmHg
• Flash Point: °C
• PSA: 0.00000
• Density: g/cm³
• LogP: -2.90320
• Water Solubility.: it is insoluble in water.
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 0
• Rotatable Bond Count: 0
• Exact Mass: 235.90041
• Heavy Atom Count: 3
• Complexity: 0

Purity/Quality:

98%Min ^*data from raw suppliers

Hafnium silicide ^*data from reagent suppliers

Safty Information:

• Pictogram(s):  
• Hazard Codes: 

MSDS Files:

SDS file from LookChem

Useful:

• Canonical SMILES: [Si].[Si].[Hf]
• Uses: They have been used as ohmic contacts, Schottky barrier contacts, gate electrodes, local interconnects, and diffusion barriers. FeSi2 has become the remarkable source as high temperature thermoelectric material. It is also used as a powder in ceramic materials.

Technology Process of Hafnium silicide

There total 2 articles about Hafnium silicide which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

hafnium + silicon (7440-21-3) → hafnium disilicide (12401-56-8)

Guidance literature:

In solid; Hf film deposited on Si(001) at room temp. in vac., annealed at 1000 °C for thick films and at 750 °C for thin;

DOI:10.1103/PhysRevB.69.235322

Reference yield:

magnesium silicide (22831-39-6) + hafnium tetrachloride (13499-05-3) → Hf2Si + hafnium disilicide (12401-56-8)

Guidance literature:

In neat (no solvent); byproducts: MgCl2; vac. or N2 filled glove box; mixt. grinding, heating in evac. sealed quartz ampoule at 850°C for 10 h, cooling to room temp., grinding; powder trituration with MeOH or H2O;

upstream raw materials:

silicon

magnesium silicide

hafnium tetrachloride

Refernces

• 1、 Fitzmaurice, Jonathan C.,Hector, Andrew L.,Parkin, Ivan P.,Rowley , Adrian T.. "SYNTHESIS OF METAL SILICIDE POWDERS BY THERMOLYSIS OF METAL CHLORIDESI WITH MAGNESIUM SILICIDE". . p. 47 - 56. Retrieved 2007/10/02.