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5796-98-5

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5796-98-5 Usage

Description

Bis(trimethylsilyl) peroxide, also known as (1), is an organosilicon compound with the chemical formula (Me3SiO)2O. It is a colorless liquid at room temperature and is known for its electrophilic hydroxylating properties. BIS(TRIMETHYLSILYL)PEROXIDE is characterized by its boiling point of 41°C at 30 mmHg and a refractive index of 1.3970 at 20°C.

Uses

1. Used in Organic Synthesis:
Bis(trimethylsilyl) peroxide is used as an electrophilic hydroxylating agent for aliphatic, aromatic, and heteroaromatic anions. It reacts with lithium or Grignard compounds to form trimethylsiloxy intermediates, which can be desilylated with HCl in methanol to produce the corresponding alcohols in good yields. In these reactions, the Me3SiO? moiety acts as a synthon for the hydroxyl cation (i.e., OH+).
2. Used in Bayer-Villiger Oxidation:
Bis(trimethylsilyl) peroxide is employed as a reagent for the Bayer-Villiger oxidation of ketones, a chemical reaction that converts ketones into esters or lactones. This application is particularly useful in the pharmaceutical and chemical industries for the synthesis of various organic compounds.
3. Used in the Production of Phenols:
In the presence of a catalytic amount of trifluoromethanesulfonic acid, Bis(trimethylsilyl) peroxide reacts with aromatic compounds to produce the corresponding phenols after acidic workup. This application is valuable in the synthesis of various phenolic compounds, which are widely used in the chemical, pharmaceutical, and materials science industries.

Preparation

obtained in 80–96% yields by reaction of chlorotrimethylsilane with 1,4-diazabicyclo[2.2.2]octane· (H2O2)2,hexamethylenetetramine·H2O2,or hydrogen peroxide–urea in CH2Cl2.

Check Digit Verification of cas no

The CAS Registry Mumber 5796-98-5 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 5,7,9 and 6 respectively; the second part has 2 digits, 9 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 5796-98:
(6*5)+(5*7)+(4*9)+(3*6)+(2*9)+(1*8)=145
145 % 10 = 5
So 5796-98-5 is a valid CAS Registry Number.
InChI:InChI=1/C6H18O2Si2/c1-9(2,3)7-8-10(4,5)6/h1-6H3

5796-98-5 Well-known Company Product Price

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  • TCI America

  • (B3497)  Bis(trimethylsilyl) Peroxide (contains Hexamethyldisiloxane) (ca. 30% in Hexane)  

  • 5796-98-5

  • 5g

  • 1,990.00CNY

  • Detail

5796-98-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name BIS(TRIMETHYLSILYL)PEROXIDE

1.2 Other means of identification

Product number -
Other names trimethyl(trimethylsilylperoxy)silane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:5796-98-5 SDS

5796-98-5Relevant articles and documents

LANGLEBIGE α-METALLIERTE METHYLRADIKALE UND DEREN DIMERE

Hillgaertner, Horst,Neumann, Wilhelm P.,Schulten, Winfried,Zarkadis, Antonios K.

, p. 197 - 211 (2007/10/02)

Persistent radicals R'2C-MR3 (I), R'C(MR3)2 (II) and RC(MR3)OMR3 (III), R'=mostly Ph but also t-Bu, H, R'2=also 9-fluorenyl or 9-xanthenyl, M=Si, Ge, Sn, have been generated from the corresponding C-H or C-Hal compounds or by addition of R3M to ketones.Radicals I, II and III are investigated by ESR spectroscopy.A temperature-dependent equilibrium has been found between these radicals and their dimers (IV), of, as far as investigated, quinonoid structure.Dimers IV rearrange with acids giving diaryl methanes.Autoxidation of radicals I at 80 deg C gives thebenzpinacol derivatives, whose radicals are oxidized again, undergoing different fragmentations.At room temperature, however, the dimers IV are attacked by O2 forming the metalated benzophenone derivatives via fragmentation, which are split by UV light into the radicals R3M (M=Si, Ge, Sn) and the oxyl radicals, which are highly stabilised by mesomerism.

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